Dear （his name）
After the discussion , i have reexamined my design. Some problem of processes were found. The refilled LPCVD SiO2 process can be cancelled, so the main issue is the DRIE process.
But for the cost , the complexity of the whole process and some processes being unvailable in center,actually, it is highly risky to finish all the process properly.
Last a few months, many rounds of simulations have been done in order to get the design parameter. the parameters were finally fixed some days ago. So the thickness about the SOI wafer we required were also be defined. But the masks cannot be finished until the processes are all determined.
So i'm not sure if i could continue my project with new design or not , or i need to redesign again? The whole process is stuck.
I ask for a request that i want to work in my dormitory until i make sure what i will do that can lead me to finish the Ph.D, definitely. I can use the remote controls to control the workstation to run the simulation in my dormitory. There is no need to stay in the centor if i do nothing about the experiment. All the work can be done in my dorm. Zaijun has already gotten the fourth-round samples' test results, and Xiaoshan has also drawn the second round sample mask, but i was still standing almost in the beginning . i feel much more pressure in the study room. So i hope i can working in my dorm where i could feel better.
the next work that i can think about is
next, 1)Try to find some ways to reduce the process steps.
2)design a simple and less-step process if there have a chance,
3)learn the ANSYS to do the more complex simulation.
and last, i'm sorry for my poor work.
Best Regards,
zixin
前几天在天涯上学到了个词儿，悲催。
不晓得我这封信是不是也很悲催。
（备注：感谢这份悲催的信，我可能几乎已经上道了……）
posted on 2010-10-11 00:32
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